Horizontal Deposition Sputtering System
SCT offers Horizontal (SS Series) sputter systems with chamber diameters from 12 inches to 45 inches. These tools are suitable for research and development as well as high-rate production. One example of these range of systems is the VS-27C vertical, batch-type sputter system which is designed for maximum flexibility. It meets the challenges of almost every sputtering deposition process.
Whether your applications is research and development or production, the VS-27C will optimize your sputtering requirements – for silicon wafers, gallium arsenide, thin-film computer heads, hybrid devices, optical memory discs.
This versatility results from the wide combination of features available in the VS-27C.
The VS-27C is offered in sputter up, sputter down or side sputter designs with a side mounted cryo-pump. It features high conductance valving and close-coupled, variable orifice plates. Pumpstack options include liquid nitrogen or water vapor pump baffles.
Standard substrate fixturing is a 24-inch flat plate planetary. Both six and twelve planet versions provide superior step coverage and thickness uniformities of ±3 percent. Other optional substrate fixtures are available for your specific needs.
Up to six planer magnetron DC and/or RF sputtering cathodes can be used in the VS-27C, and any combination of RF etching, RF and/or DC bias, ion beam milling and substrate heating. An optional substrate loadlock is also available.
Extensive shielding prevents cross contamination, minimizes particulates and extends operating life.
The chamber is constructed of 304 stainless steel, 27″ in inside diameter and 12″ high. A 4″ viewport is installed in the front of the chamber. The system bottom plate is entirely useable for mounting sources or tooling. The top plate is Viton O-ring sealed and is supported by an electrical hoist allowing ample vertical travel. The top plate is open for sources or tooling except for the few square inches required for hoist attachment.
The chamber is supported by a welded steel tube frame at a height which allows ease of operation and service. The pumping stack and all valving is enclosed but readily accessible for maintenance. A dual 19″ instrument rack (single bay optional) allows the positioning of all controls for convenient operation.
All valves are electropneumatically actuated and all actuators are bellows sealed. Viton O-rings are used for all static seals. A complete set of gauging ports and sensors are provided. Rough vacuum is sensed by two thermocouple gauges and high vacuum is measured using Bayard-Alpert gauges mounted in the chamber and the cryopump. A metal sealed port is provided for the addition of the RGA of your choice.
Programmable Vacuum System Controller with Data Logging Capabilities
SCT provides a standard a PLC industrial controller. This system includes ladder logic software with any programming for the SCT sputter system. The custom operator/engineer computer interface includes a touch screen display, HMI, and all required software programming. The control system also performs data logging of all key process variables.
All system wiring and workmanship conforms to OSHA and SEMI standards. Power wiring is engineered with safety in mind, is fully interlocked and easy to service or modify.
Actuator signal wiring is 24 volts or lower and all control logic uses industrial grade 12 volt signal levels with an exceptional degree of noise immunity.
SCT engineers can add your choice of substrate carriers, sputter sources, power supplies and custom electronics. The VS-27C provides the standard base upon which to build a custom sputtering system capable of addressing your unique requirements.